Skip to main content

Trimethylgallium

ADVERTISEMENT
Identification
Molecular formula
Ga(CH3)3
CAS number
1445-79-0
IUPAC name
trimethylgallane
State
State
Trimethylgallium is a liquid at room temperature, however, it is noted for its pyrophoric properties, igniting spontaneously in air.
Melting point (Celsius)
-15.00
Melting point (Kelvin)
258.15
Boiling point (Celsius)
55.30
Boiling point (Kelvin)
328.45
General information
Molecular weight
114.76g/mol
Molar mass
114.7640g/mol
Density
1.1614g/cm3
Appearence

Trimethylgallium is a colorless liquid that can look clear but is often marketed and handled with care due to its reactive nature.

Comment on solubility

Solubility of Trimethylgallane

Trimethylgallane (Ga(CH3)3) is a fascinating organometallic compound that exhibits unique solubility characteristics. It is primarily known for its reactivity rather than its solubility in typical solvents. Here are some key points regarding its solubility:

  • Solubility in Organic Solvents: Trimethylgallane is highly soluble in a variety of organic solvents such as hexane, toluene, and diethyl ether. This property enables its use in synthesis and reactions where organic environments are crucial.
  • Water Solubility: In contrast, trimethylgallane is virtually insoluble in water. This is common for organometallic compounds, primarily due to their hydrophobic characteristics.
  • Stability: While it is soluble in certain solvents, trimethylgallane can decompose in the presence of moisture or air, forming gallium oxides or hydroxides. Hence, it must be handled in an inert atmosphere or under vacuum.

The solubility behavior of trimethylgallane emphasizes the general trend observed in many organometallic compounds, where they tend to favor organic solvents while avoiding polar solvents like water.

Interesting facts

Interesting Facts About Trimethylgallane

Trimethylgallane, also known as gallane, is a fascinating organometallic compound that plays a significant role in various applications, particularly in the field of chemistry and materials science. Here are some intriguing aspects of this compound:

  • Structural Insights: Trimethylgallane features a unique tetrahedral geometry around the gallium atom. This distinctive structure is a result of its three methyl groups, which can influence its chemical reactivity and interactions with other substances.
  • Precursor for Semiconductor Manufacturing: One of the most notable uses of trimethylgallane is as a precursor in the production of gallium-containing semiconductors, including gallium arsenide (GaAs). These materials are critical for fabricating high-performance electronics, including lasers and infrared light-emitting diodes (LEDs).
  • Air Sensitivity: Trimethylgallane is sensitive to moisture and air, which necessitates careful handling. Its reactivity under ambient conditions makes it a subject of study in the development of safer chemical storage and processing methods.
  • Research Applications: In the realm of research, trimethylgallane has been used to explore gallium's chemical behavior and bonding characteristics. Scientists use it to better understand how gallium can interact with other compounds and the potential for new applications.
  • Sustainable Chemistry: As the demand for gallium-based materials grows, researchers are investigating more environmentally friendly production methods involving trimethylgallane, contributing to the development of sustainable practices in the chemical industry.

In summary, trimethylgallane serves as more than just a simple chemical compound; it is a vital part of advancements in semiconductor technology and materials science, displaying both chemical intrigue and practical importance in the modern world.

Synonyms
TRIMETHYLGALLIUM
Gallium, trimethyl-
EINECS 215-897-6
DTXSID2061696
Gallium, trimethyl
TMGa SSG
DTXCID7034701
215-897-6
un3394
1445-79-0
trimethylgallane
MFCD00014841
Gallium trimethyl
Trimethylgallium, elec.gr.
Trimethylgallium, elec. gr.
(CH3)3Ga
AKOS015914830
NS00081434
A808237
Q419426
Trimethylgallium, packaged for use in deposition systems