MDM (MDMHS)

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Identification

Molecular formula
C15H34O3Si4
CAS Number
3390-61-2
IUPAC Name
dimethyl-(methyl-phenyl-trimethylsilyloxy-silyl)oxy-trimethylsilyloxy-silane
Molecular Weight
382.79g/mol
Melting Point
and a high boiling point, making it stable for various chemical processes.
Boiling Point
(Celsius)
Density
0.9738g/cm3
Synonyms
17906-09-1
Interesting facts

Interesting Facts about Dimethyl-(Methyl-Phenyl-Trimethylsilyloxy-Silyl)Oxy-Trimethylsilyloxy-Silane

Dimethyl-(Methyl-Phenyl-Trimethylsilyloxy-Silyl)Oxy-Trimethylsilyloxy-Silane is a fascinating compound that finds extensive applications in the fields of chemistry and materials science. Here are some intriguing points to consider:

  • Silicon-Containing Compounds: This compound belongs to a class of organosilicon compounds that are notable for their versatility. They can act as coupling agents, surface modifiers, and precursors to various silicon-based materials.
  • Structural Complexity: The structure of dimethyl-(methyl-phenyl-trimethylsilyloxy-silyl)oxy-trimethylsilyloxy-silane is sophisticated, showcasing numerous functionalities which enable its use in a variety of chemical reactions.
  • Applications in Coatings: This compound is used in the formulation of advanced coatings, enhancing properties such as hydrophobicity, durability, and adhesion.
  • Silicone Chemistry: With the presence of trimethylsilyloxy groups, this compound is linked to silicone chemistry, which is crucial in developing high-performance elastomers and gels.
  • Research Significance: In academic and commercial research, this compound can serve as a model for studying the interactions and behaviors of silicon in different environments.

As a chemical scientist or student, understanding compounds like dimethyl-(methyl-phenyl-trimethylsilyloxy-silyl)oxy-trimethylsilyloxy-silane enhances one's ability to innovate within materials science. Its diverse applications make it a compound worthy of attention in both industrial and research settings. Remember, the world of silicones is not just vast but crucial for the advancement of technology today!

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